PRODUCT REVIEW
T Zone Glitter Peel Off Mask Black
Can it cause trouble?
Buy from Amazon US $11.47
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Price as of 2/7/2023 1:15 GMT.
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Product summary
What can the product work for?
Moisturizing
glycerin
0.95% -
1.4%
Irritation risk:
Concentration: Effectiveness: HIGH
One of the best moisturizing ingredients. Naturally present in skin. It attracts water to the upper layer of the skin working as a humectant
urea
0.15% -
0.65%
Irritation risk:
Concentration: Effectiveness: HIGH
Naturally present in skin (urea makes up about 7% of natural moisturizing factors in skin). Attracts water to the upper layer of the skin. Also has a positive effect on the skin barrier beyond the humectant action. Can enhance penetration of other ingredients. Is an exfoliating ingredient when used in high concentrations
butylene glycol
1.5% -
2.2%
Irritation risk:
Concentration: Effectiveness:
LOW
Used to create a nice product texture and help delivery of other ingredients. Might be somewhat helpful in attracting water to the upper layer of the skin
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Anti-blemish
What does the product description say?
centella asiatica extract
0.35% -
0.8%
Irritation risk:
Concentration: Insufficient!
A plant extract that has been shown to be able to reduce inflammation in skin, support restoration of skin barrier function, as well as support collagen production. Contains active compounds called centelloids: asiaticoside, madecasosside, asiatic acid and madecassic acid. Might be helpful in preventing stretch marks. It can be itself be irritating though.
Honesty check
How honest is this product?
Promise | Can it deliver? |
---|---|
Anti-blemish |
Total Promises Fulfilled score:
0/100.
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Can it cause trouble?
- Overall product irritation risk
- Acne & comedogenic risk ingredients: 0
Potential irritants
alcohol
3.7% -
5.5%
Irritation risk:
Works for:
Antibacterial
Can be drying and contribute to skin irritation. Used in formulars to dissolve other ingredients, create a thinner product consistency or for its antibacterial properties
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Comodogenic ingredients
No comodogenic ingredients detected
User reviews (0)
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Key ingredients |
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Irritancy | IRRITANCY
HIGH
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MEDIUM
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HIGH
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MEDIUM
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HIGH
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MEDIUM
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HIGH
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MEDIUM
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MEDIUM
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Ingredients & concentrations
All ingredients
Key Actives
centella asiatica extract
0.35% -
0.8%
Irritation risk:
Works for:
Moisturizing,
Anti-inflammatory,
Reduces redness,
Reduces irritation,
Anti-oxidation,
Anti-aging,
Anti-blemish
A plant extract that has been shown to be able to reduce inflammation in skin, support restoration of skin barrier function, as well as support collagen production. Contains active compounds called centelloids: asiaticoside, madecasosside, asiatic acid and madecassic acid. Might be helpful in preventing stretch marks. It can be itself be irritating though.
urea
0.15% -
0.65%
Irritation risk:
Works for:
Moisturizing,
Exfoliation
Naturally present in skin (urea makes up about 7% of natural moisturizing factors in skin). Attracts water to the upper layer of the skin. Also has a positive effect on the skin barrier beyond the humectant action. Can enhance penetration of other ingredients. Is an exfoliating ingredient when used in high concentrations
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Potential irritants
alcohol
3.7% -
5.5%
Irritation risk:
Works for:
Antibacterial
Can be drying and contribute to skin irritation. Used in formulars to dissolve other ingredients, create a thinner product consistency or for its antibacterial properties
Show more
Comodogenic ingredients
We couldn't find any comodogenic ingredients in this product
All ingredients
alcohol
3.7% -
5.5%
Irritation risk:
Works for:
Antibacterial
Can be drying and contribute to skin irritation. Used in formulars to dissolve other ingredients, create a thinner product consistency or for its antibacterial properties
Show more
Ingredient list view
Water, Polyvinyl alcohol, Alcohol, C11-15 sec-pareth-12, Ppg-1-peg-9 lauryl glycol ether, Rayon, Butylene glycol, Hamamelis virginiana bark/leaf extract, Unknown, Charcoal powder, Glycerin, Styrene/acrylates copolymer, Phenoxyethanol, Aminomethyl propanol, Chlorphenesin, Helichrysum italicum extract, Centella asiatica extract, Urea, Ci 19140, Ci 15850, Ci 42090, Parfum, Ethylhexylglycerin, Peg-40 hydrogenated castor oil, Ci 77000
Sources
- Glycerol and the skin: holistic approach to its origin and functions
- Amended Safety Assessment of Acrylates Copolymers as Used in Cosmetics
- Anti-Inflammatory Effect of Titrated Extract of Centella asiatica in Phthalic Anhydride-Induced Allergic Dermatitis Animal Model
- Centella asiatica in cosmetology
- Triterpene Composition and Bioactivities of Centella asiatica
- Asiaticoside induction for cell-cycle progression, proliferation and collagen synthesis in human dermal fibroblasts
- Assessment report on Centella asiatica (L.) Urban, herba
- Centella asiatica in Dermatology: An Overview
- The Effects of a Standardized Extract of Centella asiatica on Postlaser Resurfacing Wound Healing on the Face: A Split-Face, Double-Blind, Randomized, Placebo-Controlled Trial
- Topical urea in skincare: A review
- Analysis of Dyes in Cosmetics: Challenges and Recent Developments