PRODUCT REVIEW
T-Zone Glitter Mask Peel Off Black
Can it cause trouble?
Buy from Amazon US $11.47
More options from: $11.47
Price as of 2/7/2023 1:14 GMT.
More info
Add to Compare
Cheaper alternatives
What can the product work for?
Moisturizing
glycerin
1.5% -
2.2%
Irritation risk:
Concentration: Effectiveness: HIGH
One of the best moisturizing ingredients. Naturally present in skin. It attracts water to the upper layer of the skin working as a humectant
urea
0.2% -
0.75%
Irritation risk:
Concentration: Effectiveness: HIGH
Naturally present in skin (urea makes up about 7% of natural moisturizing factors in skin). Attracts water to the upper layer of the skin. Also has a positive effect on the skin barrier beyond the humectant action. Can enhance penetration of other ingredients. Is an exfoliating ingredient when used in high concentrations
butylene glycol
2.1% -
3.2%
Irritation risk:
Concentration: Effectiveness:
LOW
Used to create a nice product texture and help delivery of other ingredients. Might be somewhat helpful in attracting water to the upper layer of the skin
Show more
Anti-blemish
What does the product description say?
T-Zone Glitter Mask Peel Off Black draws out impurities to help keep skin clear.
centella asiatica extract
0.35% -
0.85%
Irritation risk:
Concentration: Insufficient!
A plant extract that has been shown to be able to reduce inflammation in skin, support restoration of skin barrier function, as well as support collagen production. Contains active compounds called centelloids: asiaticoside, madecasosside, asiatic acid and madecassic acid. Might be helpful in preventing stretch marks. It can be itself be irritating though.
Anti-aging
What does the product description say?
GLOW BOOSTING Enriched with skin caring Strawflower and firming Centella Asiatica Extract, to help the skin look more vibrant and glowing.
centella asiatica extract
0.35% -
0.85%
Irritation risk:
Concentration: Insufficient!
A plant extract that has been shown to be able to reduce inflammation in skin, support restoration of skin barrier function, as well as support collagen production. Contains active compounds called centelloids: asiaticoside, madecasosside, asiatic acid and madecassic acid. Might be helpful in preventing stretch marks. It can be itself be irritating though.
Exfoliation
What does the product description say?
purify the skin and unclog pores, prevent build-up of dead skin cells and help skin look more vibrant and glowing Contains biodegradable glitter made from plant cellulose
urea
0.2% -
0.75%
Irritation risk:
Concentration: Effectiveness:
MEDIUM
Naturally present in skin (urea makes up about 7% of natural moisturizing factors in skin). Attracts water to the upper layer of the skin. Also has a positive effect on the skin barrier beyond the humectant action. Can enhance penetration of other ingredients. Is an exfoliating ingredient when used in high concentrations
Honesty check
How honest is this product?
| Promise | Can it deliver? |
|---|---|
| Anti-aging | |
| Exfoliation | |
| Anti-blemish |
Total Promises Fulfilled score:
33/100.
Buy now
We receive a small commission for purchases made through these links at no cost for you. Thank you for your support! Learn more
US Retailers
AU Retailers
.png?width=10&height=10&q=50&func=fit){kind=small}
Can it cause trouble?
- Overall product irritation risk
- Acne & comedogenic risk ingredients: 0
Potential irritants
alcohol
3.7% -
5.6%
Irritation risk:
Works for:
Antibacterial
Can be drying and contribute to skin irritation. Used in formulars to dissolve other ingredients, create a thinner product consistency or for its antibacterial properties
helichrysum italicum extract
0.35% -
0.8%
Irritation risk:
A plant extract used to conceal the smell of other ingredients in a product. Has anti-microbial properties. Can be irritating
Show more
Comodogenic ingredients
No comodogenic ingredients detected
User reviews (0)
Similar products & dupes
| T-Zone - Glitter Mask Peel Off Black |  Skinfood - Pineapple Peeling Gel Sponsored |  T Zone - Charcoal & Bamboo- Black Peel Off Mask |  OFRA - Revitalizing Clay Mask |  endota spa - Rapid Enzyme Peel |  Kiehl's - Ultra Facial Masque |  111SKIN - The Radiance Concentrate |  bareMinerals - Phyto-AHA Radiance Peeling Mask |  SVR - ABC Instant Plumping + Hydration Vitamin B3 5% Bio-Cellulose Sheet Mask |  Eve Lom - Moisture Mask by Eve Lom |  SKIN - Hydrating B5 Masque |  SkinCeuticals - Hydrating B5 Masque Hyaluronic Acid Gel Mask | |
| Price | ||||||||||||
| WIMJ similarity score |
52%
|
60%
|
57%
|
55%
|
55%
|
54%
|
54%
|
54%
|
54%
|
54%
|
54%
| |
| Key ingredients |
| Common: Other:
| Common: Other: | Common:
Other: | Common: Other:
| Common: Other: | Common: Other: | Common: Other: | Common: Other:
| Common: Other: | Common: Other:
| Common: Other:
|
| Irritancy | IRRITANCY
MEDIUM
| IRRITANCY
MEDIUM
| IRRITANCY
MEDIUM
| IRRITANCY
MEDIUM
| IRRITANCY
MEDIUM
| IRRITANCY
LOW
| IRRITANCY
LOW
| IRRITANCY
MEDIUM
| IRRITANCY
LOW
| IRRITANCY
LOW
| IRRITANCY
LOW
| IRRITANCY
LOW
|
| Potential Irritants |
|
|
|
|
|
|
|
|
|
|
|
|
| All ingredients |
|
|
|
|
|
|
|
|
|
|
|
|
Ingredients & concentrations
All ingredients
Key Actives
centella asiatica extract
0.35% -
0.85%
Irritation risk:
Works for:
Reduces redness,
Moisturizing,
Anti-inflammatory,
Reduces irritation,
Anti-oxidation,
Anti-aging,
Anti-blemish
A plant extract that has been shown to be able to reduce inflammation in skin, support restoration of skin barrier function, as well as support collagen production. Contains active compounds called centelloids: asiaticoside, madecasosside, asiatic acid and madecassic acid. Might be helpful in preventing stretch marks. It can be itself be irritating though.
urea
0.2% -
0.75%
Irritation risk:
Works for:
Moisturizing,
Exfoliation
Naturally present in skin (urea makes up about 7% of natural moisturizing factors in skin). Attracts water to the upper layer of the skin. Also has a positive effect on the skin barrier beyond the humectant action. Can enhance penetration of other ingredients. Is an exfoliating ingredient when used in high concentrations
Show more
Potential irritants
alcohol
3.7% -
5.6%
Irritation risk:
Works for:
Antibacterial
Can be drying and contribute to skin irritation. Used in formulars to dissolve other ingredients, create a thinner product consistency or for its antibacterial properties
helichrysum italicum extract
0.35% -
0.8%
Irritation risk:
A plant extract used to conceal the smell of other ingredients in a product. Has anti-microbial properties. Can be irritating
Show more
Comodogenic ingredients
We couldn't find any comodogenic ingredients in this product
All ingredients
alcohol
3.7% -
5.6%
Irritation risk:
Works for:
Antibacterial
Can be drying and contribute to skin irritation. Used in formulars to dissolve other ingredients, create a thinner product consistency or for its antibacterial properties
Show more
Ingredient list view
Water, Polyvinyl alcohol, Alcohol, Vinylamine/vinyl alcohol copolymer, Butylene glycol, Charcoal powder, Glycerin, Xanthan gum, Phenoxyethanol, Ethylhexylglycerin, Citric acid, Chlorphenesin, Helichrysum italicum extract, Centella asiatica extract, Urea, Ci 19140, Ci 15850, Ci 42090, Parfum, Ethylhexylglycerin, Ci 77000, Disodium edta, Synthetic fluorphlogopite, Ci 77891, Titanium dioxide, Ci 77491, Iron oxides, Tin oxide
Sources
- Glycerol and the skin: holistic approach to its origin and functions
- Anti-Inflammatory Effect of Titrated Extract of Centella asiatica in Phthalic Anhydride-Induced Allergic Dermatitis Animal Model
- Centella asiatica in cosmetology
- Triterpene Composition and Bioactivities of Centella asiatica
- Asiaticoside induction for cell-cycle progression, proliferation and collagen synthesis in human dermal fibroblasts
- Assessment report on Centella asiatica (L.) Urban, herba
- Centella asiatica in Dermatology: An Overview
- The Effects of a Standardized Extract of Centella asiatica on Postlaser Resurfacing Wound Healing on the Face: A Split-Face, Double-Blind, Randomized, Placebo-Controlled Trial
- Topical urea in skincare: A review
- Analysis of Dyes in Cosmetics: Challenges and Recent Developments