AVA Laboratorium Botanical HiTech - Effective cleansing Make-up removal

AVA Laboratorium Botanical HiTech Effective cleansing Make-up removal

Efficacy100/100

Works for:

based on ingredients and %
  • Cleansing

Can it cause trouble?

  • Irritation risk: medium
  • Comedogenic risk ingredients: 4

Key actives

Tocopherol0.3% - 0.55%Oleic acid0.5% - 0.75%Cetearyl alcohol2.3% - 2.9%
Price unavailable
Amazon US
Price unavailable
Find on Amazon US
Submit an edit
Price unavailable
Amazon US